Dow SiLK™ I 360 Semiconductor Dielectric Resin
Material Notes: SiLK™ I 360 is designed for easy integration and extendibility, and its formulations offer a robust feature set. High thermal stability and fracture toughness means SilK™ I 360 is compatible with standard IC processing tools in todays fabrications. SiLK™ I 360 is fluorine-free, thus is compatible with Ti and Ta barrier materials.Information provided by Dow
Available Properties |
- Water Absorption
- Thickness
- Tensile Strength, Ultimate
- Tensile Strength, Yield
- Tensile Modulus
- Dielectric Constant
- Dielectric Strength
- CTE, linear 20°C
- Thermal Conductivity
- Glass Temperature
- Shrinkage
- Refractive Index
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Property Data |
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